Search results for "barium silicate"
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Elaboration and characterization of barium silicate thin films.
2008
International audience; Room temperature depositions of barium on a thermal silicon oxide layer were performed in ultra high vacuum (UHV). In-situ X-ray photoelectron spectroscopy (XPS) analyses were carried out as well after exposure to air as after subsequent annealings. These analyses were ex-situ completed by secondary ion mass spectrometry (SIMS) profiles and transmission electron microscopy (TEM) cross-sectional images. The results showed that after air exposure, the barium went carbonated. Annealing at sufficient temperature permitted to decompose the carbonate to benefit of a barium silicate. The silicate layer was formed by interdiffusion of barium with the initial SiO2 layer.
Fabrication and characterization of barium silicate ultrathin films as an alternative gate oxide
2008
Down-scaling of elementary CMOS elements requires the replacement of SiO2 as a gate oxide. By the identification of the formation conditions of barium silicate in direct contact of a silicon substrate, this study revealed a potential candidate. First of all, a reaction between Ba and SiO2 leading to the formation of barium silicate as been evidenced by in-situ XPS and SR-PES analyses. Then, barium silicate films have been elaborated by oxygen and barium co-deposition at 580 °C. Thermal treatments under vacuum showed that barium silicate was thermally stable up to 900 °C. TEM and SIMS ex-situ analyses revealed a sharp interface with the substrate. Finally, an experimental setup dedicated to …